Proposed State-of-the-Art facility

• Simulation Lab.: A device simulation laboratory would be established.
• Nano material Lab.: Novel and nano materials would be synthesized by setting up nano materials synthesis laboratory.
• Thin Film Lab.: Pulsed Laser Deposition (PLD) for growing thin films: PLD technique (specially with Excimer Laser), which has great advantages over other techniques, would be used for realizing thin films of complex materials. Emphasis would be to realize near-epitaxial/highly oriented thin films of complex materials as they would be highly desirable for device work.
• Structural characterization Lab.: X-ray Diffraction (XRD) with SAXS: Vital tool for characterizing novel and nano materials and thin films would be setup in the structural characterization lab. Latest XRD (SMART LAB 3) has incident X-ray optics which can do powder diffraction, thin films and Small Angle X-ray Scattering (SAXS) without changing the incident beam optics. This Lab. will also have other major facilities like FE-SEM and AFM for characterization of nano-materials and thin films.
• Electrical characterization lab.: A device structure measurement laboratory would be established using C-V & I-V probers, Resistivity & Hall measurement setup, Gas Sensing measurement setup and the Facility for bio molecular detection using cw-Terahertz system.
• Device Structure Lab.: A lithography laboratory for device-structure fabrication of basic devices for proof-of-concept work would be established in a 500 sqft. class 1000 clean room.